Chemical vapor deposition furnace (CVD furnace) is a device used to heat and gasify reaction sources such as metal halides, metal organics, and hydrocarbons under a specific pressure, and then react to produce solid deposits on the surface of the target material. It is widely used in material purification, new crystal development, deposition of various single crystals, polycrystalline or glassy inorganic thin film materials.
One or more Controlled carbon source gases are pyrolyzed in a preheated gas distribution plate. Single-layer graphene is grown on a metal substrate by CVD. 95% full coverage of single-layer graphene can be achieved through multiple etching depositions
Graphene Growth Metal Substrate: Copper foil, Ruthenium, Iridium, Nickel, etc.
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